Student written Research Laboratory Guidebook 2023Nagaoka University of Technology

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Laboratory of Physical Chemistry for Molecules and Plasmas

Associate Professor / Haruhiko ITO

Associate ProfessorHaruhiko ITO

profiles and activiities profiles and activiities at nagaoka university of technology
J-GLOBAL
  • Open up the future of materials with plasma!
  • Possibility of plasma
  • New material made with plasma

Supervisor

Associate Professor / Haruhiko ITO
We are studying the synthesis of thin films using plasma CVD processes. In addition, we are investigating the formation mechanism of thin films in detail by detecting the free radicals generated by plasma with a precise method using the laser spectroscopy.

Research Content

This laboratory is investigating the spectroscopic properties of unstable molecular species (free radicals) generated in the discharge plasma flow with detail by high resolution laser spectroscopy. In addition, this laboratory studies the synthesis of amorphous carbon nitride thin films by using discharge plasma. Features of amorphous carbon nitride thin film are high hardness, field emission characteristics and others. Therefore, it is expected to be put into practical use as a next-generation high-performance material. Actually, this laboratory synthesizes amorphous carbon nitride thin films, and investigates their formation mechanism and characteristics based on the plasma spectroscopic measurements.

Laser equipment and microwave plasma CVD equipment

A Day in the Lab

When we arrive at the laboratory, we turn on the vacuum pumps to prepare the experiments.
Until the vacuum is reached, we are talking with other members and preparing seminars in the laboratory. The time to go home will vary from member to member, as experiment times vary by device. Sometimes, we go out for dinner after the experiment. I think that it is a good laboratory to cultivate autonomy because the schedule in the laboratory is left up to each person.

Microwave plasma CVD equipment

Thesis Subjects

  • (M)Formation and structual analysis of the carbon nitride thin films with high-nitrogen content using radio-frequency plasma CVD.
  • (M)Analysis of the chemical bonds of the a-CNx:H thin films formed from the plasma CVD of the C6H6/N2 gas mixture.
  • (M)Synthesis and structural analysis of the carbon nitride thin films with high mechanical hardness using dissociation reaction of cyanides.

The number of
PhD Graduates

2

Major employers of Graduates

  • DIAMET CORPORATION.
  • UNION TOOL CO.
  • TANKEN SEAL SEIKO CO.,LTD.
  • Furukawa Electric CO.,LTD.
  • FUJITSU COMPONENT LIMITED
  • NIIGATA PREFECTURAL POLICE
  • FURUKAWA MAGNET WIRE CO.,LTD.
  • Kobe Material Testing Laboratory Group.
  • RIKEN SEIKI CO.,LTD.
  • Tamura Corporation.
Writer : KARO Yoshinori, Materials Science and Technology
(National Institute of Technology, Nagaoka College)