This laboratory is investigating the spectroscopic properties of unstable molecular species (free radicals) generated in the discharge plasma flow with detail by high resolution laser spectroscopy. In addition, this laboratory studies the synthesis of amorphous carbon nitride thin films by using discharge plasma. Features of amorphous carbon nitride thin film are high hardness, field emission characteristics and others. Therefore, it is expected to be put into practical use as a next-generation high-performance material. Actually, this laboratory synthesizes amorphous carbon nitride thin films, and investigates their formation mechanism and characteristics based on the plasma spectroscopic measurements.
Laser equipment and microwave plasma CVD equipment