We are tackling low-temperature thin-film deposition using the ELAMOD method. Using an excimer laser to crystallize substrates that were difficult to deposit on using conventional thermal processes and materials that were difficult to layer, we are fabricating transparent conductive films and photoelectrodes. Fabrication is performed in diverse environments, including at room temperature, on hot plates, and in combination with plasma.
For photoelectrodes, in addition to the ELAMOD method, we also fabricate them by spin-coating a solvent prepared using a bead mill onto anodized films and then sintering them in an electric furnace.